Ion-beam sputtering (IBS) is used to achieve extremely steep filter edges, excellent blocking properties, or for multiple filters. This coating technology is outstandingly suitable for producing efficient beam splitters or short-pass, long-pass and band-pass filters, for example. Highly reflective coatings produced using the IBS process are able to achieve a blocking level of up to OD 6 and also boast the advantage of high laser-damage thresholds. Furthermore, highly efficient beam splitters can be realized – including variants with a
50 % / 50 % split +/- 1 %.
For ion-beam sputtered (IBS) coatings, the substrate is brought into the vicinity of the coating material, the so-called target. A separate ion source activates the target by bombarding it so that atoms are beaten out and become deposited on the substrate in the form of a layer. Ion generation from the target and the substrate are kept completely separate, with the result that the thermal load on the substrates during coating is less than that during conventional vapour deposition.
In order to achieve very dense, even and virtually defect-free layers, coating is performed under cleanroom conditions:
Whether the products are band-pass filters, notch filters or beam splitters produced by ion-beam sputtering – the quality of the substrate is likewise of great relevance to the quality of the outcome.
State-of-the-art IBS units are used for high-end applications in the optical sphere. There are many benefits from the highly reflective coatings realized by these means:
In ion-beam sputtering coating technology, the coating material (used in the form of targets in the unit) is abraded through bombardment by ion sources. During sputtering, the material contacts the substrate with high energy and becomes deposited at dense intervals. Virtually perfect layers are achieved on level substrates.
In addition to ion-beam sputtering, there are other types of sputtering coating processes. A summary of the most important sputtered coatings follows below:
Ion-beam sputtering is particularly suitable for making very dense, even and defect-free layers.
The ion-beam sputtering system produces the highest-quality optical thin films with improved productivity and throughput. An ion beam system provides outstanding control of layer thickness and improved process stability. It was developed for the latest optical interference coating applications from band-pass filters to beam splitters.
Beam splitters for automatic quality assurance in production in the spheres of
Band-pass filters for different laser wavelengths for